China’s Domestic DUV Push Marks Progress but Not an ASML Replacement

Shanghai, China, 28 July 2026 – China has reportedly begun limited production of domestically developed immersion deep-ultraviolet lithography machines, marking progress in one of the most difficult parts of the semiconductor supply chain. The development advances Beijing’s drive for technology self-reliance, but the early systems still face major tests before they can challenge established equipment at commercial scale.

Immersion DUV tools use 193-nanometre light and a layer of water to print very small circuit patterns on silicon wafers. They are workhorses for mature and advanced chipmaking, particularly when multiple exposures are used. China has been unable to buy the most advanced extreme-ultraviolet systems, while access to some high-end DUV equipment has also tightened under export controls.